previous section: 6/9 page: 7/10 next

6Treatment - implant retention or removal

During initial clearance, a distal opening is created at the lower end of the nail track, in order to allow debris...

During initial clearance, a distal opening is created at the lower end of the nail tract, in order to allow debris from reaming to escape, and to drain the “sump”. The canal is then reamed to a diameter 1.5 mm larger than the removed nail, and is thoroughly and copiously washed out with Ringer-lactate solution. If there are obvious cortical sequestra, these need removal by open procedure.